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Spray Metal Liftoff


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Avoid metal redeposition and scratching caused by batch soak liftoff tools. ASAP Single Station 60WPH. Si GaAs Sapphire GaN SiC

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ASAP offers a liftoff system to suit your application. From a single process station for spray liftoff and rinse to 3 dedicated liftoff stations and a rinse station for high throughput. The Liftoff system can be ordered with either manual wafer loading for low cost process qualification applications or automatic loading for high production. All configurations have automatic processing driven by recipes and offer full SECS/GEM interfacing if needed.

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COAT DEVELOP LIFTOFF

Combination Coater / Developer with Liftoff capabilities all on one platform. 
Cost savings is realized by having only one footprint and leveraging the auto 
wafer handling capability for all three applications. Perfect tool configuration 
for a low volume production or R&D facility.

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Custom 2-Sided Coat / Aligner / Develop Solutions

ASAP has developed and manufactured several custom tools.  This example is an integration of an ASAP Aligner, Coater and Developer track with wafer flipper for exposing and processing of both sides of the wafer.  ASAP has several hundred systems installed including an equal number of Liftoff, Coater and Developer tools.

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