Avoid metal redeposition and scratching caused by batch soak liftoff tools. ASAP Single Station 60WPH. Si GaAs Sapphire GaN SiC
ASAP offers a liftoff system to suit your application. From a single process station for spray liftoff and rinse to 3 dedicated liftoff stations and a rinse station for high throughput.
The Liftoff system can be ordered with either manual wafer loading for low cost process qualification applications or automatic loading for high production.
All configurations have automatic processing driven by recipes and offer full SECS/GEM interfacing if needed.