Annealsys (ECM Group, Montpellier) manufactures RTP (Rapid Thermal Processing) and DLI-CVD/ALD (Direct Liquid Injection Chemical Vapor Deposition/Atomic Layer Deposition) systems for R&D and low-volume production.

RTP platforms (Jipelec and Annealsys brands) span up to 2000°C with high-vacuum capability, addressing implant activation, silicidation, oxidation, and nitridation on wafer substrates. DLI-CVD/ALD configurations target multifunctional oxides, graphene, h-BN, and TMD deposition for MEMS, power/discrete devices, optoelectronics, and telecom applications. ISO 9001-certified; ~900 installed systems globally.