Lightwind supplies OES (optical emission spectroscopy) and downstream absorption spectroscopy systems for real-time in-situ gas phase monitoring in CVD, ALD, plasma etch, and sputtering tools.
Their L Series downstream spectroscopy systems and Lx RGA-replacement platform operate down to 10⁻⁸ Torr, providing species identification and concentration monitoring without the filament contamination and ionization artifacts inherent to traditional quadrupole RGAs. Core use cases include plasma etch endpoint detection, CVD chamber clean endpoint, process drift monitoring, and leak detection. S Series offers viewport/window-mount OES for direct plasma emission analysis.